What are the steps involved in the core etching process?

Core process flow of photochemical etching

1. Material preparation

Choose metal plates such as stainless steel and titanium alloy (0.05-2.0mm) for cleaning and degreasing to ensure surface cleanliness.

2. Apply photoresist

Apply UV photoresist evenly on the surface of the metal plate.

3. Exposure and development

The design pattern is accurately transferred onto the photoresist through ultraviolet exposure and chemical development.

4. Chemical etching

Dissolve metal in unprotected areas using etching solution to form the desired pattern.

5. Post processing

Remove residual photoresist, clean the circuit board, and conduct quality inspection.

6. Forming and assembly

Assemble etched parts into three-dimensional structures through processes such as bending and welding.

Process advantage

Stress free processing to maintain material properties

Can generate complex and precise graphics

Suitable for mass production of thin metal parts

Wide adaptability of materials