Types Of Metal Etching Processes

Metal etching process is a technique that removes metal materials through chemical reactions or physical impacts, widely used in fields such as mold making, scale making, mechanical parts, and electronic component manufacturing. According to different processing requirements and material types, metal etching processes can be divided into various types, including chemical etching, electrolytic etching, mechanical etching, etc.
Chemical etching:
Chemical etching is the process of removing one or more layers of material from a metal surface through chemical reactions to form the desired pattern or structure. The process usually includes steps such as pre etching, etching, water washing, acid immersion, removal of resist film, and drying. This method has the advantages of high precision, non-destructive processing, and strong flexibility, and is suitable for small batch high-precision processing
Electrolytic etching:
Electrolytic etching uses electrolyte to dissolve metal surfaces under the action of an electric field, and is suitable for processing materials such as copper and stainless steel. The process flow includes steps such as entering the tank, turning on the power, etching, washing with water, acid immersion treatment, and drying. This method can achieve finer machining results.
Mechanical etching:
Mechanical etching removes metal surface materials through physical means such as milling, cutting, or spraying, and is commonly used in mold making and part processing. This method is suitable for application scenarios that require high strength and durability.
Wet etching and dry etching:
Wet etching is performed using liquid chemical reagents, while dry etching is performed using gas or ion beams in a vacuum environment. Wet etching is suitable for large-scale production, while dry etching is more suitable for high-precision microfabrication.

Special etching technology
Cyclic etching: suitable for long-term processing, keeping the solution composition unchanged, ensuring repeatability and independence.
Vacuum etching: Etching is performed using a low-pressure environment under vacuum conditions, suitable for single crystal gas growth.
Fog etching: Surface final etching is performed by spraying fine particles to optimize electrical properties and clarity.